Plasma Etch PE-50-LF with vacuum pump and dual gas inputs

The Plasma Etch PE-50 is a compact, entry-level, 125W benchtop plasma system (6"W x 6"D x 4"H chamber) designed for surface cleaning, activation, and modification.

It features low-bias, 50KHz RF power, and dual gas flow controllers, making it ideal for research,, universities, and small-scale production, particularly for PDMS, MEMs, and semiconductor applications. 

Key Features and Specifications:

• Chamber Size: 6"W x 6"D x 4"H Aluminum vacuum chamber.
• Power: 200W, 50KHz RF power supply (variable).
• Gas Handling: Dual roto-meters for independent gas control/mixing.
• Vacuum Pump: 5 CFM pump with Fomblin oil for oxygen compatibility.
• Control System: PLC-based with a keyboard for recipe storage.
• Applications: Cleaning, activation, surface modification of polymers, metals, ceramics, and silicone. 

Common Uses:

• Removing organic contamination from surfaces.
• Surface treatment for PDMS and microfluidics.
• Enhancing adhesion for coatings or adhesives.
• Etching for semiconductor, printed circuit board, and medical device manufacturing. 

Specifications

Electrode Configuration

One or Two Horizontal (5"Wx6"D)

Generator

200W 20-80KHz Auto Frequency Tuning with Adjustable Pulsing Rate

Gas Control

Two 0-25cc/min Rotometers with Precision Needle Valves

Control System

PLC-Based Keypad Input System with Alphanumeric Display; Stores One Recipe for Automatic Process Sequencing

Vacuum Gauge

1-2000 mT

Vacuum Pump

5CFM 2-Stage Direct Drive Oil Pump (Oxygen Service – Krytox Charged)

Chamber Material

6061-T6 Aluminum

Chamber Dimensions

5.5”Wx7”Dx3.5”H

Unit Dimensions

14"x14.5"x18"

Unit Weight

55lbs