2014 Ultra T SCS 133 Substrate Cleaning System

Maximum 20" substrate capacity

Touchscreen interface

Inline DI water heater

Reionizer

Vacuum system

Light tower for status indication

The Ultra T SCSx133 (Substrate Cleaning System) is an industrial, precision spin coater, and substrate cleaning platform manufactured by the ULTRA t Equipment Company.

It is used in semiconductor fabrication and material science labs to clean, coat, and process wafers, photomasks, and other high-tech substrates.

Key Technical Specifications

Physical Footprint: The standalone cabinet measures 43” wide x 37” deep x 44” tall. Adding the DI water heater option extends the total depth by an extra 7.5”.

Power Demands: Operates on a single-phase, 3-wire electrical connection at 50/60 Hz with a full load draw of 18 amps.

Recipe Capabilities: Features micro-processing controls capable of retaining 30 distinct processing recipes, each offering up to 30 sequential steps (expandable up to 90 recipes upon custom request).

Core Machine Capabilities

Process Arms: Supports a maximum of four independent process arms for multi-step chemical distributions.

Dispense Options: Offers customized system integration for fixed or oscillating low-pressure washes, atomizing mist, surfactant canisters, or megasonic DI-H2O delivery.

Scrubbing & Drying: Built with a height-adjustable, self-cleaning brush assembly alongside an N2 drying assist system utilizing 0.02 µm filtration.

Safety & Standards: Engineered strictly to compliance guidelines (SEMI S2/S8). It utilizes secondary containment built with automated leak detection, high-purity chemically compatible materials (Polypropylene, PVDF, or PTFE), and safety interlocks that lock down the chamber until processing completes safely