Semilab CMS3 non contact sheet resistance measuring system

Semilab CMS3 non contact sheet resistance measuring system

$17,500 (USD)

or
Call (408) 209-9278

Description

CMS, CLS

FAST NON-CONTACT MATERIAL CHARACTERIZATION AND PROCESS CONTROL

Emitter sheet resistance is a primary quality control parameter for silicon wafers in PV applications after emitter diffusion.

The CLS models, CLS-1A, CLS-3A, and CLS-5A, Emitter Sheet Resistance Testers allow measurement of sheet resistance at 1 to 5 points with the high throughput that meets the requirements of in-line quality control in fully automated cell production lines.

The CMS models, CMS-1A, CMS-3A, Emitter Sheet Resistance Testers allow measurement of wafers  i.e. conveyor belt does not stop during measurement. Therefore, they have the high throughput that meets the requirement of in-line quality control in fully automated cell production lines.

Featrues and System specifications:

  • Meas. technique: non-contact, junction photovoltage (JPV)
  • Sample size: 100 to 156 mm (210mm option)
  • Sample structure: np or pn junctions
  • Measurement range: 10 Î/sq. to 200 I/sq.
  • Probe distance: 1.5 mm probe height above transport bel
  • Wafer vertical position tolerance: < 400 μm
  • Sample support: on belt
  • Calibration: by wafers verified with four point probe

    • Options:

  • Measurement module (incl. 1A-5A sheet resistance measurement heads)
  • Industrial PC (Windows operation system) and peripherals
  • CLS-1M emitter checker option
  • Wafer presence sensor (CMS only)

    • Wide variety of available interfaces to automation and MES:

  • 24V optically isolated I/O, Ethernet interface
  • Profibus
  • OPC DA
  • TCP/IP protocol, content can be XML or ASCII
  • SQL database
  • SECS/GEM
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    Specifications

    Stock Number3724
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