Plasmatherm SLR720 shuttle lock RIE for compound semiconductor etching

Plasmatherm SLR-720 RIE tool

Configured for etching of metals and compound semiconductors

Previous usage was etching of GaAs with chlorine chemistry 

PC controller. Vacuum load lock with wafer transfer robot.

Can process wafers from 2” to 8” depending on which process kit is installed.

Currently configured with 4” kit.

Helium backside thermal cooling in conjunction with computer controlled substrate clamping.

High frequency RFPP plasma source 13.56mHz

Closed loop pressure control.

Leybold Turbo pump.

Total of six MFC gas controllers. Previous gases used N2, O2, He, CHF3, Cl2, BCL3

Includes Thermo Neslab water chiller