N&K 1512 Thin Film Measuring System

Ultra-High Sensitivity Thin Film Measurement System

Includes Calibration base wafer

The n&k 1500 utilizes raw Reflectance (R) data to determine the optical properties (n and k) and thicknesses of thin films

This manual load system with automated stage is designed to wafers up to 300mm. With a 1mm spot size, the raw reflectance data is acquired over a wide wavelength range (190 – 1000nm) with optimized signal-to-noise ratio, resulting in the capability of the n&k 1500 to accurately measure thickness.

On the software end, a valid physical model utilizes the Forouhi-Bloomer Dispersion Equation for n and k, to analyze raw Reflectance data. The Forouhi-Bloomer (FB) model describes the Refractive Index, n, and the Extinction Coefficient, k, as functions of wavelength, λ, and was derived based on first principles quantum mechanics. The scientific derivations of the FB model were originally published in 1986 and 1988, and a related patent was subsequently granted in 1990.