PVA Tepla 9204 (FORMERLY GASONICS) plasma asher with 4 gas channels

208v, 3 phase, 50/60hz, 20 amps

Exceptional condition: Quartz barrel shows no sign of etching or use12"(dia) x 20"(D) quartz barrel

Seren 600 watt Rf power supply 13.56mhz

External wall mounted power distribution and contactor box with EFO

serial no. 2049

The 9200 offers:

• Traditional quartz barrel design
• 100, 150, & 200 mm wafer capability
• Patented etch tunnel minimizes charge damage
• Reliable operation
• Through-wall mounting
• Optical end point detection
• Windows® based color touch screen interface
• Easy maintenance
• Wafer Size: 4″, 6″, 8″ capability
• Capacity: 50 8” wafers, 50-75 6” wafers, 100 4” wafers.
• Controller: Windows® O/S based touch screen interface offering fully automatic control. Multi-step recipes, real time graphic display, multi-level password access, data logging, and real time SPC monitoring of all plasma parameters is provided.
• Chamber: Quartz, compatible with fluorinated chemistry. 12″ diameter x 20″ deep. External RF electrodes.
• RF Generator: 600 watt 13.56 MHz air cooled with automatic impedance matching network.
• Process Pressure: Approx. 120 – 2000 mtorr.
• Stainless Steel Plumbing.
• Temperature Monitor: Quartz-coated thermocouple located in the process chamber.
• Optical End Point Detector.
• RS232 Interface.
• Display: Color 12.1″ touch screen for control and monitoring of process parameters, automatic recipes, or manual plasma treatments.
• Two user specified gases, with 500 sccm Stainless Steel MFCs come standard with an optional 3rd and/or 4th gas channel available.
• Power Requirements: 208 – 240 volts, 3ø, 50/60 Hz 5 wire “wye”.
• A NEMA-12 wall mounting enclosure with locking handle contains the system AC power control for the system and pump, allows for a single source drop for the complete system.
• CE Certified.