Suss Microtec Labspin 8 resist coater for wafers up to 200mm
Suss Microtec Labspin 8 resist coater for wafers up to 200mm
$11,000 (USD)
Description
Designed for a variety of photolithography chemicals, LabSpin systems provide uniform, precise and repeatable spin coating results on the wafer through its advanced process chamber design.
LabSpin8 is suitable for round substrates up to 200 mm diameter or square substrates up to 150x150 mm.
With a wide range of substrate holders, even fragments and special shapes can be processed without any problems.
The LabSpin platform is characterized by a compact and space-saving design and requires little clean room space.
The large variety of LabSpin options allows a very wide range of applications.
Coatings can be applied manually with syringes, semi-automatically with cartridges or with up to two fully automatic dispensing systems.
In addition to edge coating, edge bead removal and puddle development, further options are available.
SUSS LABSPIN8 TT Table top system for wafer up to 200 mm round or up to 150 mm square substrates
Consisting of: + Spinner module + Control Unit + Bowl cover made of safety glass + Process bowl made of Polypropylene
Digital vacuum gauge
Safety features: + Vacuum monitoring + Cover open interlock
Integrated into a table top cabinet made of stainless steel
Technical data: + 115/230 VAC; 60/50 Hz; 5/3 A single phase
Speed: 50 - 99 rpm, 100 - 8,000 rpm (+/- 1 rpm) with 200 mm chuck
Acceleration: 4,000 rpm/sec
Spinning time: 1 s up to 999 s + 200 recipes with 40 steps each + Waste bottle 0.5l
Exhaust connection PG11 tube
Dimensions (W x D x H): Cabinet: 350 x 446 x 430 (691 cover open) mm³
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Specifications
| Stock Number | 4807 |
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