CHA Mark 50 ISS (Isolated Source) Electron Beam Deposition System

CHA Industries Mark 50 Isolated Source E-Beam Evaporator System

Refurbished and upgraded with all new Telemark power supply and sweep controllers in 2021

Evaporator as of April 2025 is still installed in clean room in Palo Alto, CA, removed from HP lab October, 2025

The CHA Mark 50 ISS Systems havea quick-access source design for maintenance, and a "load lock" chamber designed to isolate the source(s) from the process chamber between loading and unloading wafers. Mk50's with this feature enable: Pre-deposition processes to be performed in the process chamber while isolated from the source(s), substrates can be loaded and unloaded while the deposition sources are maintained under a high level of vacuum, or vacuum integrity can be maintained for a batch of substrates while the source chamber can be vented during the run.

2ea Granville-Phillips 307 vacuum gauge controllers

Inficon IC6 deposition controller

Telemark SX-10 power supply 10kVA HVPS-T-18373 (2022)

Telemark ST/SX controller (2022)

Telemark programmable sweep controller (2022)

CHA beam gun rotation controller, shutter controller, fixture controller

4 pocket electron beam source

Ion gun with Auto controller for preclean

Substrate heaters with power supply and controller

Cryocoil controller

AUTO Etch IV deposition controller

Trillium 2200 AUTO cryopump controller

Power requirements 120-208V/3/ 60Hz 5 wire 145 amps

Busch BA 0100A dry pump

Cryotorr 400 cryo pump

CTI Cryogenics 9600 compressor

Includes domes for both 6in and 4in substrates. 

Serial no. 1181-18373

Telemark SX-10 power supply specifications— All Solid State switch mode design — Rugged overrated IGBT inverter for superior reliability — Extensive arc management with arc counter and arc duration sensor for fastest arc recovery and outstanding performance — Adjustable voltage 0 to -10kV (0 to -8kV for ST-4 and ST-6) with precise regulation (<+/- 0.25%) for stable beam position; ultra low ripple for minimum beam size — Constant emission current regulation <+/- 0.5% — Simultaneous ornsequential operation of two sources — Air cooled — Full remote operation from PLC or optional Handheld for both High Voltage and Emission Current — 19 Inch rack mountable, ultra compact High Voltage Module: 8.75" (5U) Controller: 1.75" (1U) —

Digital Sweep or Programmable Sweep Previously installed in thru-wall clean room configuration

Fully operational

Previous usage: Evaporation of Ag, Au, Pt, Ta, Cr, Ti