SSE Opticoat ST60+ large-format spin coating system for substrates up to 600mm diameter(24")

SSE/ Robotechnik OPTIcoat ST60+

Large-format spin coating system

designed for the controlled application of photoresist and other thin-film materials to wafers and substrates.

The enclosed, stand-alone system features an integrated process chamber,

Programmable controls,

Electrical: 208 VAC, three-phase, N/PE, 50/60 Hz

Nitrogen supply: 2–3 bar

Compressed air: 8 bar

Vacuum: 0.8 bar

Exhaust connections:

Includes the controller, workstation, process components and

accessories shown in the photographs.

Key Specifications & Features

• Substrate Capacity: The ST60 platform is engineered to handle large-scale wafer processing up to a maximum product diameter of Ø 600 mm, making it suitable for large substrates and advanced display panels.
• Covered Chuck Technology: It features patented "Covered Chuck" technology which controls the atmospheric environment above the wafer during spinning. This provides exceptional coating uniformity and repeatability for both thin and thick resist layers, high-topography substrates, and square substrates.
• Modular Configurations ("+"): The "+" designation typically indicates integrated multi-module configurations. While standalone models function strictly as spin coaters, the "+" systems usually combine the spinning process chamber with integrated baking hotplates (such as the OPTIhot series) or vapor priming (HMDS) capabilities within a unified cabinet footprint.
• Control System: Equipped with an intuitive industrial touch-screen Human-Machine Interface (HMI) running PC-based recipe management software to easily configure custom spin curves, acceleration rates, and chemical dispense