Trion Apollo Plasma Stripper

Ebara EV-S20P dry pump

SMC chiller

The Apollo Stripper is a compact, inexpensive, and versatile system which can be configured for a 200mm or 300mm Chuck. By employing RF bias power, difficult to remove layers of resist can be removed at low temperatures. As required by application, this system can incorporate a microwave source (which is both reliable and free from typical microwave tuning problems) or ICP technology.

Apollo

• Etch rates up to 6um/min
• High throughput
• Low plasma damage
• Automatic tuning
• 100mm to 300mm wafers
• Small footprint

Inductively Coupled Plasma (ICP) Option:

High Rate and Low Damage Photoresist Stripping is a critical necessity in modern semiconductor manufacture. As more and more masking steps and more sensitive devices have come into use, “plasma downstream ashing” has become the primary method of resist removal. The Trion Apollo Photoresist Stripper incorporates a downstream Inductively Coupled Plasma (ICP) to provide the high rate and uniform removal this application requires.

The Trion Apollo system was specifically designed for production Photoresist Descum and Stripping. This extremely reliable system provides a compact and inexpensive solution to this application.