2008 Suss Microtec Delta 80RC T3 HMDS Spin Coater with Hot plate and HMDS module

The SUSS MicroTec Delta 80RC T3 is a high-precision, semi-automatic coater designed for HMDS vapor priming (adhesion promotion) and photoresist spin coating. Engineered for R&D and pilot production, it is widely used in MEMS, microelectronics, and advanced packaging.

Key Specifications & Features

• Substrate Compatibility: Handles round wafers up to 200 mm (8 inches), square substrates, and wafer fragments.
• HMDS Vapor Priming: Features dedicated substrate heating up to 250°C to optimize photoresist adhesion.
• Hot plate module
• GYRSET® Technology: Uses a patented closed-chamber process that creates a turbulence-free, solvent-saturated atmosphere above the substrate. This minimizes resist consumption and significantly improves coating uniformity.
• Spin Speeds: Standard open bowl spin up to 4,000 to 5,000 RPM, depending on the Gyrset setup.
• Dispense System: Equipped with precision programmable dispense pumps (e.g., Wafertec) and automatic nozzle cleaning options for reliable, repeatable coating.
• Process Modules: The Delta 80 platform features modular expansion capabilities for automated Edge Bead Removal (EBR) and back-side rinsing
• 400v, 3 phase, 60Hz