Olympus MX61A-F inspection microscope with brightfield, darkfield, 8x8 motorized XY stage, 248nm deep UV module, and laser autofocus

MX61A-F frame configured for brightfield and darkfield observation

Stainless steel table with granite vibration isolation platform

Ludl motorized XY stage with 8x8 travel and MAC 5000 controller

Trinocular viewing head with U-TV1X-2 adaptor, U-CMAD3 C-mount and DP20 camera

U-LH100L-3 12v 100w lamphouse

WH-10X widefield eyepieces

M Plan Fl N 5x/0.15

BDM Plan FL N 10x/0.30

BDM Plan FL N 20x/0.45

BDM Plan FL N 50x/0.80M

Plan FL N 100x/0.90

BD248nm UV objective: MApo 248 100x/0.90 

U-LH100-3 100w halogen lamphouse

U-AFA2M-DUV laser autofocus module with BX-UCB controller and U-HSTR2 keypad

U-UVF248A motorized deep UV observation module 248nm supports resolutions u to 0.08um

INCLUDES: U-UVF248IM observation tube, UXM80E mercury/xenon burner

U-UVF248LBM light source box

U-HXT power supply

U-UVF2FB light guide

BX-UCB control box

UV M Apo 100x objective for 248nm UV light

PC WITH MXBSW CONTROL SOFTWARE

This specially designed module provides bright and high contrast deep ultraviolet real time images for detailed semiconductor and nano-fabrication inspections

The optical system optimized for 248 nm provides resolutions down to 80nm, two times better than that available with the visible light. The 248 ±4nm imaging band is corrected to prevent chromatic aberrations. This technique makes it possible to observe both high-contrast and high-resolution features without preprocessing.

Common applications for DUV observation include detailed inspections of semiconductor patterns, gap and pole identification on magnetic heads, and microlithography.