Olympus MX61A-F inspection microscope with brightfield, darkfield, 8x8 motorized XY stage, 248nm deep UV module, and laser autofocus

Description

MX61A-F frame configured for brightfield and darkfield observation

Stainless steel table with granite vibration isolation platform

Ludl motorized XY stage with 8x8 travel and MAC 5000 controller

trinocular viewing head with U-TV1X-2 adaptor, U-CMAD3 C-mount and DP20 camera

U-LH100L-3 12v 100w lamphouse

WH-10X widefield eyepieces

6 place motorized nosepiece

Option: Add DIC (Nomarski) with U-DICR DIC slider, U-AN360 rotating analyzer, U-PO3 polarizer $3950.

UIS-2 Objectives:

M Plan Semi-Apochromat - MPLFLN-BD

Designed for brightfield, darkfield, DIC (differential interference contrast), fluorescence, and simple polarized light observation methods

Plan semi-apochromat objective lens corrected for chromatic aberration for maximum performance for even for the most challenging materials science applications

Complete lineup of magnifications ranging from 2.5X through 150X.

Standard pupil position allows for the use of a single DIC prism for all objective lenses (5X–150X)

M Plan Fl N 5x/0.15 BD
M Plan FL N 10x/0.30 BD
M Plan FL N 20x/0.45 BD
M Plan FL N 50x/0.80
M Plan FL N 100x/0.90 BD

248nm UV objective:
MApo 248 100x/0.90

U-LH100-3 100w halogen lamphouse

U-AFA2M-DUV laser autofocus module with BX-UCB controller and U-HSTR2 keypad

U-UVF248A motorized deep UV observation module 248nm supports resolutions u to 0.08um
INCLUDES:
U-UVF248IM observation tube,
UXM80E mercury/xenon burner
U-UVF248LBM light source box
U-HXT power supply
U-UVF2FB light guide
BX-UCB control box
UV MApo 100x objective for 248nm UV light
PC WITH MXBSW CONTROL SOFTWARE

This specially designed module provides bright and high contrast deep ultraviolet real time images for detailed semiconductor and nano-fabrication inspections

The optical system optimized for 248 nm provides resolutions down to 80nm, two times better than that available with the visible light. The 248 ±4nm imaging band is corrected to prevent chromatic aberrations. This technique makes it possible to observe both high-contrast and high-resolution features without preprocessing. Common applications for DUV observation include detailed inspections of semiconductor patterns, gap and pole identification on magnetic heads, and microlithography.

Deep Ultraviolet Observation

Visible Light Observation

Newly designed robust DUV Objective Lens

DUV Objective Lens

The DUV lens is specially designed with a unique "non-cemented" technology to prevent deterioration found in other DUV lenses, making it an ideal solution for long-term use.

Modular Design

Increased Flexibility and Safety through an External Lamphouse

Deep Ultraviolet Observation Module

The modularity of the DUV system not only allows for integration with the Olympus MX and BX series of microscopes, but allows the mercury-xenon power supply to be independent of the microscope and directs the illumination to the DUV module via a UV light guide. The shutter design employed protects the operator by directing the illumination to the DUV objective lens and camera only. In addition, since the light source is set apart from the microscope and the intensity can be independently controlled to the optimum level, heat transition to the sample is minimized.

Real Time Imaging

The high resolution DUV digital camera is software controlled and capable of high-speed data acquisition. Images captured on the computer can be quickly documented and analyzed for easy storage in a database and report generation.

Economical and Efficient

Light Weight and Compact

The DUV intermediate tube is simple with no moving parts or external control; this allows the tube to be half the size and weight of conventional DUV microscope systems.

Efficient Mercury Xenon Lamp

Lamphouse and Power Supply

Specifications

Stock Number	4695
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