Olympus MX61A-F inspection microscope with brightfield, darkfield, 8x8 motorized XY stage, 248nm deep UV module, and laser autofocus

Description

MX61A-F frame configured for brightfield and darkfield observationStainless steel table with granite vibration isolation platformLudl motorized XY stage with 8x8 travel and MAC 5000 controllertrinocular viewing head with U-TV1X-2 adaptor, U-CMAD3 C-mount and DP20 cameraU-LH100L-3 12v 100w lamphouse

WH-10X widefield eyepieces

6 place motorized nosepieceOption: Add DIC (Nomarski) with U-DICR DIC slider, U-AN360 rotating analyzer, U-PO3 polarizer $3950.UIS-2 Objectives:

M Plan Semi-Apochromat - MPLFLN-BD

Designed for brightfield, darkfield, DIC (differential interference contrast), fluorescence, and simple polarized light observation methods

Plan semi-apochromat objective lens corrected for chromatic aberration for maximum performance for even for the most challenging materials science applications

Complete lineup of magnifications ranging from 2.5X through 150X.

Standard pupil position allows for the use of a single DIC prism for all objective lenses (5X–150X)

M Plan Fl N 5x/0.15 BDM Plan FL N 10x/0.30 BDM Plan FL N 20x/0.45 BDM Plan FL N 50x/0.80M Plan FL N 100x/0.90 BD248nm UV objective:MApo 248 100x/0.90

U-LH100-3 100w halogen lamphouseU-AFA2M-DUV laser autofocus module with BX-UCB controller and U-HSTR2 keypadU-UVF248A motorized deep UV observation module 248nm supports resolutions u to 0.08umINCLUDES: U-UVF248IM observation tube, UXM80E mercury/xenon burnerU-UVF248LBM light source boxU-HXT power supplyU-UVF2FB light guideBX-UCB control boxUV MApo 100x objective for 248nm UV lightPC WITH MXBSW CONTROL SOFTWARE

This specially designed module provides bright and high contrast deep ultraviolet real time images for detailed semiconductor and nano-fabrication inspections

The optical system optimized for 248 nm provides resolutions down to 80nm, two times better than that available with the visible light. The 248 ±4nm imaging band is corrected to prevent chromatic aberrations. This technique makes it possible to observe both high-contrast and high-resolution features without preprocessing. Common applications for DUV observation include detailed inspections of semiconductor patterns, gap and pole identification on magnetic heads, and microlithography.

Newly designed robust DUV Objective Lens

Modular Design

Increased Flexibility and Safety through an External Lamphouse

Real Time Imaging

The high resolution DUV digital camera is software controlled and capable of high-speed data acquisition. Images captured on the computer can be quickly documented and analyzed for easy storage in a database and report generation.

Economical and Efficient

Light Weight and Compact

The DUV intermediate tube is simple with no moving parts or external control; this allows the tube to be half the size and weight of conventional DUV microscope systems.

Efficient Mercury Xenon Lamp

Specifications

Stock Number	4695
Sort	0