Cee® 300X Precision Spin Coater

Substrate Capacity: Designed for 300-mm round substrates and large LCD squares up to 14” x 14”The Cee® Model 300X is a high-performance, heavy-duty spin coater designed for precise, repeatable photoresist, developer, or cleaning solution deposition on substrates ranging from small pieces up to 8-inch round or 7"x7" square wafers. It features a Windows®-based interface, high-horsepower drive for fast acceleration, and unlimited programmable recipes. 

Key Features and Capabilities:

• Performance: Spin speeds range from 1 to 12,000 RPM with a repeatability of 
•  RPM.
• Control: The system allows for unlimited programmable steps per recipe with data logging capabilities.
• Interface: Features an easy-to-use, touch-screen interface.
• Application: Suitable for research, development, and production environments, often used in cleanrooms to maintain substrate cleanliness.
• Options: Can be configured with various chucks, including vacuum chucks for specific wafer sizes (e.g., 200mm).