2013 Annealsys AS-One 150 Rapid Thermal Annealer (RTP)

The Annealsys AS-One 150 is a versatile rapid thermal processing (RTP) system primarily used for annealing, oxidation, and nitridation processes in research and industry.

It features cold-wall chamber technology for high process reproducibility and is capable of processing wafers up to 150 mm (6 inches) in diameter. 

Specification Details

Wafer/Sample SizeSmall pieces up to 150 mm (6") diameter wafers.

Temperature RangeRoom temperature (RT) up to 1300°C.

Some configurations may reach higher or lower max temperatures depending on setup (e.g., 1100°C or 1500°C).

Max Ramp Rate Up to 250°C/s for 2-inch wafers, up to 200°C/s for 3-inch, and up to 150°C/s for Si wafers generally.

Cooling Rate High cooling rates (up to 100°C/s) due to cold-wall technology.

Pressure/Vacuum Range:

From atmospheric pressure down to 10⁻⁶ Torr with turbomolecular pump and Edwards XDS5 scroll pump

Temperature ControlUtilizes both thermocouple and pyrometer control with a fast digital PID controller.

Process Gases. Gas mixing capability with mass flow controllers for gases such as N₂, O₂, Ar, H₂, NH₃.

Power: 220v 3 phase, 89A, 34KW, 50/60hz

Features

• Chamber Technology: Features a stainless steel, cold-wall vacuum-enabled chamber, which allows for fast heating and cooling rates and high process reproducibility.
• Processes Supported: Capable of a wide range of processes including Rapid Thermal Annealing (RTA), Rapid Thermal Oxidation (RTO), nitridation (RTN), diffusion, silicidation, crystallization, and potentially CVD applications.
• Control Interface: Full PC control with Windows-compatible software and advanced programming controls for precise process parameter management.
• Safety & Maintenance: Designed for easy maintenance with external access to replaceable elements and sophisticated safety features including an independent electrical circuit and emergency stop.